Technologies Overview
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Chemical Metrology
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Optical Spectrophotometry

Optical Spectrophotometry

Nova’s analyzers leverage optical spectrophotometry, a quantitative analysis technique using light to directly measure component concentrations in a plating solution. The highly accurate and fast method combines spectrometry, the measurement of the spectrum, and photometry, the measurement of light absorption at one or several wavelengths. Requiring little maintenance, optical spectrophotometry covers multiple parts of the electromagnetic spectrum, such as UV (ultraviolet) wavelengths of 200nm-400nm and VIS (visible light) wavelengths of 400nm-800nm respectively.

Optical Spectrophotometry

Highlights and Benefits

High Accuracy

Non-Destructive

Robust and Fast

Flexible

Flexible and Extendable

Low Maintenance

High Accuracy

Non-Destructive

Robust and Fast

Flexible

Flexible and Extendable

Low Maintenance

High Accuracy

Non-Destructive

Robust and Fast

Flexible

Flexible and Extendable

Low Maintenance

High Accuracy

Non-Destructive

Robust and Fast

Flexible

Flexible and Extendable

Low Maintenance

Low Maintenance

Requires little maintenance

High Accuracy

Directly measures light-absorbing components with high accuracy

Non-Destructive

Executes non-destructive, non-reagent (NRA) measurements

Robust and Fast

Advanced electronics and computer algorithms enhance speed and accuracy

Flexible

Chemistry optimized wavelength and path length

Flexible and Extendable

Covers a wide range of concentrations from ppb to g/L

Low Maintenance

Requires little maintenance

High Accuracy

Directly measures light-absorbing components with high accuracy

Optical Spectrophotometry

With optical spectrophotometry, it is also possible to modify or extend the measurement of components that do not absorb light. This is done through a derivatization technique, where a chemical reaction is created to transform the components into a measurable state, prior to the analysis.

Related Products and Technologies

Nova AncoFlex® 
Nova Ancolyzer®
High-Performance Liquid Chromatography (HPLC)
Titration

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Press Releases

ancosys Chemical Metrology Solution Selected by Additional Front-End Customer

ancosys Chemical Metrology Solution Selected by Additional Front-End Customer

09 Feb, 2022
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Nova Expands Into Advanced Chemical Metrology With ancosys Acquisition

Nova Expands Into Advanced Chemical Metrology With ancosys Acquisition

16 Nov, 2021
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Nova Completes Acquisition of ancosys

Nova Completes Acquisition of ancosys

25 Jan, 2022
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IBM Research and Nova Jointly Awarded the “Best Metrology Paper” at SPIE Advanced Lithography Conference

IBM Research and Nova Jointly Awarded the “Best Metrology Paper” at SPIE Advanced Lithography Conference

26 Apr, 2022
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Our Publications

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Optimization of Scatterometry Measurements by Enhancing with Machine Learning
April 2024
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SPIE
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Authored by: Sasmita Srichandan, Franz Heider, Georg Ehrentraut, Stephan Lilje, Christian Putzi, Sanja Radosavljevic, Egidijus Sakalauskas
On-Cell Thickness Monitoring of Chalcogenide Alloy Layer usingSpectral Interferometry, Raman spectroscopy, and Hybrid Machine Learning
April 2024
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SPIE
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Authored by: Hyunwoo Ryoo*a, Seul Ji Songb, Min Ji Jeona, Juhyun Moonb, JiHye Leea, ByungHyun Hwanga, Jeongho Ahna, Yoon-jong Songb, Hidong Kwaka, Lior Neemanc, Noga Meirc, Jaehong Jangd, Ik Hwan Kimd, Hyunkyu Kimd
From Lab to Fab: In-line SIMS for Process Control in Semiconductor Manufacturing
April 2024
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Authored by: Stefan Schoeche*a, Katherine Siega, Daniel Schmidta, Mohsen Nasseria, Shogo Mochizukia, Marinus Hopstakenb, Yaguang Zhuc, Li Xiangc, Julia Hoffmanc, Daniel Lewellync, Paul Isbesterc, and Sarah Okadac
Unique Spectral Interferometry solutions for complex High AspectRatio 3D NAND structures
April 2024
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SPIE
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Authored by: Jaesuk Yoona, Jongmin Parka, Minjung Shina, and Dongchul Ihma, Oshrat Bismuthb, Smadar Ferberb, Jacob Ofekb, Igor Turovetsb, Isaac Kim, aFlash Process Development Team MI, Samsung R&D Center, Hwaseong, Korea, NOVA Ltd, Rehovot, Israel, Nova Measuring Instruments Korea Ltd., Gyeonggi-do, Korea.
A Flexible Deep Learning Based Approach for SEM Image Denoising
April 2024
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Authored by: Jun Chen, Xinheng Jiang, Keisuke Goto, Takashi Tsutsumi, Yasutaka Toyoda Hitachi High-tech Corp.,
Spectral Interferometry for TSV Metrology in Chiplet Technology
April 2024
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Authored by: Stefan Schoeche, Daniel Schmidt, Junwon Han, Shahid Butt, Katherine Sieg, Marjorie Cheng, Aron Cepler, Shaked Dror, Jacob Ofek, Ilya Osherov, and Igor Turovetsc IBM Research, 257 Fuller Road, Albany, NY 12203, USA Nova Measuring Instruments Inc., 3342 Gateway Blvd, Fremont, CA 94538, USA Nova Ltd., 5 David Fikes St., Rehovot, 7632805, Israel

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