Nova VeloCD

Optical CD platform for high productivity and high-performance metrology

Nova VeloCD

Nova VeloCD is an advanced standalone dimensional metrology platform, optimized for high productivity in a wide range of Logic and Memory applications. 
It features state-of-the-art metrology and handling hardware, together with a suite of advanced modeling and machine learning algorithms, to offer optimal metrology performance. 

Highlights and Benefits

Unmatched Throughput

High Availability

Enhanced Metrology

Industry Leading ML

Unmatched Throughput

High Availability

Enhanced Metrology

Industry Leading ML

Unmatched Throughput

Dual measurement units enable rapid multi-site measurement per wafer, delivering best-in-class throughput for high sampling rates

High Availability

A low-maintenance high-brightness light source, together with a highly robust handling system, boosts uptime while reducing platform maintenance frequency and associated costs

Enhanced Metrology

An extended wavelength range with improved SNR enables high-precision metrology with improved budget time and repeatability

Industry Leading ML

Comprehensive advanced modeling tools allow a shorter time to solution (days to hours) and enable precise and accurate metrology with Stack-maker and Nova Swift

Nova Prism 2 Adoption Expands; Selected by a Leading Logic Manufacturer

Why Nova VeloCD?

The Nova VeloCD is a cutting-edge standalone dimensional metrology platform designed for Advanced Logic and Memory applications. It integrates advanced metrology and handling hardware with sophisticated modeling and machine learning algorithms, ensuring optimal performance.

Key features include dual parallel measurement units for high throughput, a low-maintenance bright light source for high availability, and an extended wavelength range for enhanced precision. Finally, Nova VeloCD offers industry leading machine learning modeling tools that significantly reduce the time to solution and enable precise and reliable metrology.

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Press Releases

IBM Research and Nova Jointly Awarded the “Best Metrology Paper” at SPIE Advanced Lithography Conference

IBM Research and Nova Jointly Awarded the “Best Metrology Paper” at SPIE Advanced Lithography Conference

26 Apr, 2022
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Nova Introduces Unique Portfolio to Address Next-Generation Logic Fabrication Challenges

Nova Introduces Unique Portfolio to Address Next-Generation Logic Fabrication Challenges

17 Feb, 2022
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