Nova MMSR+

High-End platform optimized for most complex 3D applications

Nova MMSR+

Nova  MMSR+ is a high-end standalone dimensional metrology platform targeted for critical dimensions (CD) and thin film measurements for complex Optical CD applications. The combination of robust hardware, advanced modeling and machine learning algorithms offers faster throughput, high precision, and accuracy, critical for yield and cost of ownership optimization in a high-volume production environment.

Highlights and Benefits

Multiple Data Channels

Optimized Channel Selection

Robust Platform

Multiple Data Channels

Optimized Channel Selection

Robust Platform

Multiple Data Channels

Advanced discrete measurement multi-channel Ellipsometry with rich spectral information combined with Normal Incidence Reflectometry provides exceptional metrology solutions for complex 2D and 3D structures with better accuracy and precision

Optimized Channel Selection

Ensures leading metrology performance by utilizing advanced algorithms for automatic channel selection to optimize optical measurement while ensuring high productivity and reducing time to solution

Robust Platform

Proven system architecture designed to guarantee outstanding stability and reliability and to achieve the highest performance level of the most demanding semiconductor standards, while meeting customer needs for cost of ownership efficiency

Nova MMSR+

Why Nova MMSR+?

Nova MMSR+ delivers extremely low variability and market-leading tool-to-tool matching to monitor and track critical parameters throughout the various steps of the most advanced IC device fabrication processes.

Incorporating Nova’s advanced suite of modeling solutions, Nova MMSR+ provides high-end performance for critical dimensions and thin film measurements of the most complex layered stacks and structures. Supported by Nova’s central fleet management, control, and connectivity solutions, Nova MMSR+ enhances operational efficiency and advanced metrology control functionality.

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Press Releases

Nova Introduces Unique Portfolio to Address Next-Generation Logic Fabrication Challenges

Nova Introduces Unique Portfolio to Address Next-Generation Logic Fabrication Challenges

17 Feb, 2022
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IBM Research and Nova Jointly Awarded the “Best Metrology Paper” at SPIE Advanced Lithography Conference

IBM Research and Nova Jointly Awarded the “Best Metrology Paper” at SPIE Advanced Lithography Conference

26 Apr, 2022
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