Nova T550®

Best cost of ownership and full commonality to integrated metrology

Nova T550®

Nova T550® is a high-productivity dimensional metrology platform designed to address the unique challenges of the semiconductor manufacturing industry while delivering a highly efficient and effective solution for advanced nodes

 

Highlights and Benefits

Enhanced Metrology Performance

Direct Device Measurements

Highest Productivity

100% Compatible to Nova i550®

Engineering Station Supporting IM Product Line

Enhanced Metrology Performance

Direct Device Measurements

Highest Productivity

100% Compatible to Nova i550®

Engineering Station Supporting IM Product Line

Enhanced Metrology Performance

Unique hardware and modeling capabilities, fully matched with Nova’s integrated metrology fleet, providing excellent cost of ownership

Direct Device Measurements

Measures logic and memory in-die structures, including complex 1D, 2D, 3D and direct devices

Highest Productivity

Faster throughput delivers better productivity

100% Compatible to Nova i550®

Utilizing the same optic design

Engineering Station Supporting IM Product Line

Used for recipe creation and as a redundancy tool that enables Pre/ Post measurement for additional sites and data collection

Nova T550®

Why Nova T550®?

Part of Nova’s fleet of solutions, Nova T550® is built with unique features to keep the cost of ownership down for semiconductor manufacturers. With full commonali­­ty and the same optic design as the Nova i550® integrated metrology platform, Nova T550® completes Nova’s unique, highly efficient CMP and etch metrology and process control offering.

The high productivity and excellent metrology performance of the Nova T550® enables increased sampling rates and high-performance film thickness and optical CD metrology capabilities for advanced nodes. The platform’s robust architecture delivers extremely low variability and superior tool-to-tool matching.

When supported by Nova’s central management, control and connectivity suite, Nova T550® enhances operational efficiency and advanced metrology control functionality.

 

 

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Press Releases

Nova Introduces Unique Portfolio to Address Next-Generation Logic Fabrication Challenges

Nova Introduces Unique Portfolio to Address Next-Generation Logic Fabrication Challenges

17 Feb, 2022
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IBM Research and Nova Jointly Awarded the “Best Metrology Paper” at SPIE Advanced Lithography Conference

IBM Research and Nova Jointly Awarded the “Best Metrology Paper” at SPIE Advanced Lithography Conference

26 Apr, 2022
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