Nova T500®

High-productivity metrology platform

Nova T500®

Nova T500® is a high-productivity metrology platform designed to address the unique challenges of the semiconductor manufacturing industry. The powerful platform delivers increased sampling rates and advanced metrology capabilities.

 

Highlights and Benefits

Industry Standard, Field Proven Platform

Outstanding Performance

100% Compatible to Nova i500®

Engineering Station Supporting IM Product Line

Industry Standard, Field Proven Platform

Outstanding Performance

100% Compatible to Nova i500®

Engineering Station Supporting IM Product Line

Industry Standard, Field Proven Platform

Sets the industry standard for CMP process control, with thousands of deployments and proven reliability at customer sites, with optional field upgrades to further increase productivity

Outstanding Performance

Best-in-class accuracy, repeatability and tool-to-tool performance

100% Compatible to Nova i500®

Utilizing the same design

Engineering Station Supporting IM Product Line

Used for recipe creation and as a redundancy tool that enables Pre/ Post measurement for additional sites and data collection

Nova T500®

Why Nova T500®?

Nova T500® helps manufacturers meet the growing need for high productivity in advanced semiconductor manufacturing. Featuring the same optical design and having full commonality with the Nova i500® integrated metrology platform, Nova T500® completes the company’s unique, highly efficient CMP metrology and process control offering.

As part of Nova’s fleet solution for semiconductor manufacturers, Nova T500® is qualified to support a broad range of tools, including Nova i500®, and is available in multiple configurations. 

When supported by Nova’s central management, control and connectivity suite, Nova T500® platform enhances operational efficiency and advanced metrology control functionality.

 

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Press Releases

Nova Introduces Unique Portfolio to Address Next-Generation Logic Fabrication Challenges

Nova Introduces Unique Portfolio to Address Next-Generation Logic Fabrication Challenges

17 Feb, 2022
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IBM Research and Nova Jointly Awarded the “Best Metrology Paper” at SPIE Advanced Lithography Conference

IBM Research and Nova Jointly Awarded the “Best Metrology Paper” at SPIE Advanced Lithography Conference

26 Apr, 2022
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